3200 nm Picosecond Laser System
This laser system is designed and assembled on a newly researched and existing technology. The existing technology includes 10-ps 1064 nm laser having high peak power (up to 100 MW).
The newly researched technology includes down frequency converter infrared generator of 2-ps pulses at 3200 nm (energy conversion up to 8%).
Compiler Upgrade 3200 specifications
| Wavelength | 3200 nm |
| Pulse Energy | 50 uJ |
| Pulse width | 2 ps |
| Repetition rate | 100 Hz |
Laser system contains two main parts. Laser head generates 1064 nm, 600 μJ picosecond high stable pulses. Conversion system generates secondary picosecond radiation 3200 nm, 50 μJ. Laser system is mounted at the optical table as shown at the photo.
Conversion system is based on parametrical delay of 1064 nm output with excitation of 3180 nm, 1-2 ps pulses. One of the important applications is graduated evaporation (via “one-to-one” micron ablation) of thin water layers condensed on surfaces of different materials (for biochemical testing).